RTA system is Rapid Thermal Annealing system, Its temperature can reach up to 1000 ℃ within short time (~few second) by using halogen lamp as a heating element. Its window and sample holder can be used with a quartz for the thermal durability.
Temp range: 400~1000℃
Temp control accuracy: < ± 1.0°C
- Glass < ± 1.5% @ 100~ATM torr (gas flow condition)
- Wafer < ± 2% @ 100~ATM torr (gas flow condition)
Ramp up rate: Max. 40°C/sec
Susceptor size: 4 ~ 6 inch wafer and 200 X 200 (bare glass)
Process pressure: vacuum(throttle function) & ATM