"㈜인포비온"
인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다
진공장비 - PVD
Ion Beam Treatment Sputter
Details
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Ion Beam Treatment Sputter system is designed for homogeneous film coating up to
350 mm substrates. The system is extensively used for the deposition with a wide range
of materials such as insulators, metals, and semiconductors.
Two magnetron cathodes can be used in a system for multilayer deposition of each different material or co-deposition.Specification Linear anode ion source (attach the loadlock chamber)
Uniformity : ≤ 3% (at 350 mm zone)
Base pressure :
- Process Chamber ≤ 1 x 10-7 torr
- Loadlock chamber ≤ 1 x 10-6 torr
PEM (Plasma Monitoring System) : optional part
Software interfaces : HMI programing base GUI softwareApplication Metal & oxide films deposition
Thin-film transistors
Research & development
Simply ion beam cleaning