EBA (energy beam annealing) is a process that the surface of thin film can be heated with ultra-rapid speed by the bombardment of kinetic electron beam. Electron beam can be irradiated during in-situ sputter deposition or after sputter deposition for surface-only heating without any damage.
EBA source: INFO 60G ~ 120G model
Deposition source : sputter gun 3~8 inch target size
Loadlock system for sample auto transfer.
- Process chamber ≤ 1 x 10-7 torr
- Loadlock chamber ≤ 1 x 10-6 torr
Software interfaces : HMI programing base GUI software
Low-temperature poly silicon(LTPS) technology
Si crystallization by e-beam treatment
Development of TCO properties by E-beam treatment.
Surface treatment by e-beam irradiation.
Silver nano wire application
IGZO TFT application