"㈜인포비온"

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

진공장비 - PVD

EBA Assisted Sputter Deposition System

Details

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  • EBA (energy beam annealing) is a process that the surface of thin film can be heated with
    ultra-rapid speed by the bombardment of kinetic electron beam. Electron beam can be
    irradiated during in-situ sputter deposition or after sputter deposition for surface-only
    heating without any damage.

    Specification EBA source: INFO 60G ~ 120G model
    Deposition source : sputter gun 3~8 inch target size
    Loadlock system for sample auto transfer.
    Base pressure:
    - Process chamber ≤ 1 x 10-7 torr
    - Loadlock chamber ≤ 1 x 10-6 torr
    Software interfaces : HMI programing base GUI software
    Application Low-temperature poly silicon(LTPS) technology
    Si crystallization by e-beam treatment
    Development of TCO properties by E-beam treatment.
    Surface treatment by e-beam irradiation.
    Silver nano wire application
    IGZO TFT application