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제품소개
진공장비
Ion Beam Sputter System
Ion Beam Treatment
Sputter
Combi IBD System
Cluster Sputter System
Evaporator System
ARC Ion Plating System
EBA assisted Sputter
Deposition System
IBAD System
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진공부품
RF Round Ion Source
(60G)
RF Round Ion Source
(120G)
Linear Ion Source
(60X450G)
Linear Ion Source
(60X1500G)
Anode Ion Source
(700mm)
Anode Ion Source
(2400mm)
Round Anode Source
EBA Source